San Carlos, CA, United States of America

Mayu Felicia Yamamura

USPTO Granted Patents = 24 

 

Average Co-Inventor Count = 6.8

ph-index = 9

Forward Citations = 178(Granted Patents)


Location History:

  • San Carlos, CA (US) (2019 - 2023)
  • San Mateo, CA (US) (2019 - 2024)

Company Filing History:


Years Active: 2019-2024

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24 patents (USPTO):

Title: Mayu Felicia Yamamura: Innovator in Polishing Technologies

Introduction

Mayu Felicia Yamamura is a distinguished inventor based in San Carlos, California, known for his significant contributions to surface polishing technologies. With an impressive portfolio of 24 patents, Yamamura has showcased his expertise and innovative spirit in the field of materials science.

Latest Patents

Yamamura's latest patents focus on developing advanced polishing articles and methods crucial for refining processes. One notable patent describes an apparatus and method for forming polishing articles that possess a desired zeta potential. This innovation emphasizes composite polishing articles with graded properties. Specifically, the polishing article features regions made from different materials, each exhibiting distinct zeta potentials, which enhance performance during polishing and cleaning processes.

Another significant innovation involves polishing pads characterized by selectively arranged porosity. These pads contain discrete regions of varying porosity within a continuous phase of polymer material. The design includes multiple polishing elements that feature channels between them, optimizing the polishing process's effectiveness. By manipulating porosity, Yamamura's work aims to improve the efficiency and effectiveness of polishing operations.

Career Highlights

Mayu Yamamura is currently associated with Applied Materials, Inc., a leading player in the semiconductor and display technology sectors. His tenure at this company has enabled him to develop cutting-edge solutions that address the intricate demands of modern material processing.

Collaborations

Yamamura has collaborated with esteemed colleagues, including Daniel Redfield and Rajeev Bajaj. Their collective efforts have contributed to advancing polishing technologies, demonstrating the importance of teamwork in driving innovation within the industry.

Conclusion

In conclusion, Mayu Felicia Yamamura stands out as a prominent figure in the realm of polishing technologies, with a remarkable track record reflected in his 24 patents. His innovative approaches to the challenges in polishing processes signify his dedication to enhancing material science, particularly in semiconductor manufacturing. As technology evolves, Yamamura's contributions will undoubtedly continue to play a vital role in shaping the future of surface polishing techniques.

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