The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2021
Filed:
Jul. 31, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Boyi Fu, San Jose, CA (US);
Sivapackia Ganapathiappan, Los Altos, CA (US);
Daniel Redfield, Morgan Hill, CA (US);
Rajeev Bajaj, Fremont, CA (US);
Ashwin Chockalingam, Santa Clara, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Mario Dagio Cornejo, San Jose, CA (US);
Mayu Yamamura, San Mateo, CA (US);
Nag B. Patibandla, Pleasanton, CA (US);
Ankit Vora, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments of the present disclosure provide for polishing pads that include at least one endpoint detection (EPD) window disposed through the polishing pad material, and methods of forming thereof. In one embodiment a method of forming a polishing pad includes forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first layer comprising at least portions of each of a first polishing pad element and a window feature, and partially curing the dispensed first precursor composition and the dispensed window precursor composition disposed within the first layer.