The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Sep. 29, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Aniruddh Jagdish Khanna, Fremont, CA (US);
Jason G. Fung, Santa Clara, CA (US);
Puneet Narendra Jawali, San Jose, CA (US);
Rajeev Bajaj, Fremont, CA (US);
Adam Wade Manzonie, Santa Clara, CA (US);
Nandan Baradanahalli Kenchappa, San Jose, CA (US);
Veera Raghava Reddy Kakireddy, Santa Clara, CA (US);
Joonho An, Pyeongtaek, KR;
Jaeseok Kim, Cupertino, CA (US);
Mayu Yamamura, San Mateo, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Polishing pads having discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material are provided herein. In one embodiment a polishing pad features a plurality of polishing elements each comprising a polishing surface and sidewalls extending downwardly from the polishing surface to define a plurality of channels disposed between the polishing elements, wherein one or more of the polishing elements is formed of a continuous phase of polymer material having one or more first regions comprising a first porosity and a second region comprising a second porosity, wherein the second porosity is less than the first porosity.