Santa Clara, CA, United States of America

Veera Raghava Reddy Kakireddy

USPTO Granted Patents = 8 

Average Co-Inventor Count = 9.3

ph-index = 3

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 2019-2024

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8 patents (USPTO):

Title: Innovator Spotlight: Veera Raghava Reddy Kakireddy

Introduction: Veera Raghava Reddy Kakireddy is an accomplished inventor based in Santa Clara, California, known for her significant contributions to the field of polishing technology. With a remarkable portfolio of 8 patents, her innovations represent a blend of creativity and technical prowess that addresses industry challenges effectively.

Latest Patents: Kakireddy's latest patents reflect her dedication to advancing polishing processes. One of her notable inventions is a polishing pad with interconnected pores. This invention is centered around a polishing pad comprising a plurality of polishing elements and grooves, designed to enhance the efficiency of polishing surfaces. Each element contains individual posts that create effective polishing surfaces and facilitate optimal fluid flow through the interconnected pores.

Another significant patent involves structures formed using an additive manufacturing process for regenerating surface texture in situ. This innovation focuses on manufacturing polishing pads used in chemical mechanical polishing (CMP) processes. The design features multiple material domains, each configured to optimize removal rates, thus improving the overall effectiveness of the polishing process.

Career Highlights: Veera Raghava Reddy Kakireddy currently works at Applied Materials, Inc., a leading company in the field of materials engineering. Her work contributes to significant advancements in semiconductor and nanotechnology, showcasing her ability to develop innovative solutions that meet the needs of modern industry.

Collaborations: In her professional journey, Kakireddy collaborates with talented colleagues, including Rajeev Bajaj and Jason Garcheung Fung. These partnerships underscore the collaborative nature of innovation, allowing them to combine their talents to push the boundaries of technology further.

Conclusion: Veera Raghava Reddy Kakireddy exemplifies innovation in her field through her extensive patent work and contributions to cutting-edge technology. As she continues to develop groundbreaking solutions in polishing technology, her efforts not only elevate her career but also advance the industries she serves.

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