The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2024

Filed:

Jun. 14, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Shiyan Akalanka Jayanath Wewala Gonnagahadeniyage, Santa Clara, CA (US);

Ashwin Chockalingam, Santa Clara, CA (US);

Jason Garcheung Fung, Santa Clara, CA (US);

Veera Raghava Reddy Kakireddy, Santa Clara, CA (US);

Nandan Baradanahalli Kenchappa, San Jose, CA (US);

Puneet Narendra Jawali, San Jose, CA (US);

Rajeev Bajaj, Fremont, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/26 (2012.01);
U.S. Cl.
CPC ...
B24B 37/26 (2013.01);
Abstract

Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A polishing pad includes a plurality of polishing elements and a plurality of grooves disposed between the polishing elements. Each polishing element includes a plurality of individual posts. Each post includes an individual surface that forms a portion of a polishing surface of the polishing pad and one or more sidewalls extending downwardly from the individual surface. The sidewalls of the plurality of individual posts define a plurality of pores disposed between the posts.


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