Adam Wade Manzonie

Title: Adam Wade Manzonie: Innovator in Polishing Pad Technology

Introduction

Adam Wade Manzonie is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of polishing pad technology, holding a total of 2 patents. His innovative work focuses on enhancing the performance and manufacturing methods of polishing pads used in various applications.

Latest Patents

Manzonie's latest patents include "Polishing pads having selectively arranged porosity" and "Advanced polishing pads and related polishing pad manufacturing methods." The first patent describes polishing pads that feature discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material. This design includes polishing elements with channels that enhance the polishing process. The second patent outlines a polishing pad with a polishing surface designed to polish substrates, incorporating a continuous phase of polishing material with varying pore-feature densities.

Career Highlights

Adam Wade Manzonie is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the field of polishing technology. His work has contributed to advancements in the efficiency and effectiveness of polishing pads, making them essential tools in various industries.

Collaborations

Manzonie has collaborated with talented coworkers such as Puneet Narendra Jawali and Nandan Baradanahalli Kenchappa, further enhancing the innovative environment at Applied Materials, Inc.

Conclusion

Adam Wade Manzonie's contributions to polishing pad technology demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of material science and engineering, positioning him as a key figure in the advancement of polishing technologies.