Location History:
- Mesa, AZ (US) (2023)
- Hillsboro, OR (US) (2011 - 2024)
Company Filing History:
Years Active: 2011-2025
Certainly! Here is the article about inventor Matthew L Tingey:
Title: Innovator Spotlight: Matthew L Tingey, Pioneering Inventor in Electronic Substrates
Introduction:
Matthew L Tingey, a prolific inventor hailing from Hillsboro, Oregon (US), has made significant contributions to the field of electronic substrates. With an impressive portfolio of 7 patents to his name, Tingey is at the forefront of cutting-edge innovations in the technology sector.
Latest Patents:
1. Conductive Route Patterning for Electronic Substrates: Tingey's innovative method involves the formation of a conductive route for an integrated circuit assembly through a series of etching and passivation steps, resulting in a structurally sound and efficient electronic substrate.
2. Method to Enable 30 Microns Pitch EMIB or Below: Tingey's pioneering work includes the development of a package substrate and assembly that facilitates the implementation of 30-micron pitch EMIB or below, enhancing the performance and functionality of electronic devices.
Career Highlights:
Matthew L Tingey is a valued member of the esteemed Intel Corporation, a renowned technology company known for its groundbreaking advancements in the semiconductor industry. Tingey's expertise and innovative spirit have played a pivotal role in driving Intel's success and technological leadership.
Collaborations:
Throughout his career, Tingey has collaborated with esteemed colleagues such as Charles Henry Wallace and Swaminathan Sivakumar. Together, they have spearheaded groundbreaking research and development projects, pushing the boundaries of electronic substrate technology.
Conclusion:
In conclusion, Matthew L Tingey stands out as a visionary inventor reshaping the landscape of electronic substrates. His relentless pursuit of innovation and collaboration with industry experts underscores his commitment to driving technological advancement. Tingey's contributions continue to inspire and pave the way for future advancements in the field.
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