IDiyas

For the Inventor, By the Inventor

Hopewell Junction, NY, United States of America

Matthew Earl Colburn

USPTO Granted Patents = 127 


Average Co-Inventor Count = 4.3

ph-index = 23

Forward Citations = 2,355(Granted Patents)

DiyaCoin DiyaCoin = 2.55 


Inventors with similar research interests:


Location History:

  • Waukesha, WI (US) (2002 - 2004)
  • Danburu, CT (US) (2004)
  • Danbury, CT (US) (2005)
  • Austin, CT (US) (2005)
  • Austin, TX (US) (2005)
  • Hopewell Junction, CT (US) (2006 - 2009)
  • Schenectedy, NY (US) (2013)
  • Hopewell Junction, NY (US) (2003 - 2014)
  • Yorktown Heights, NY (US) (2014)
  • Armonk, NY (US) (2012 - 2015)
  • Albany, NY (US) (2011 - 2018)
  • Schenectady, NY (US) (2010 - 2023)

Company Filing History:

goldMedal107 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal16 out of 5,444 
 
University of Texas System
 patents
bronzeMedal2 out of 1,853 
 
Adeia Semiconductor Bonding Technologies Inc.
 patents
4. 2 out of 5,671 
 
Globalfoundries Inc.
 patents
5. 1 out of 14,705 
 
Infineon Technologies Ag
 patents
where one patent can have more than one assignee

Years Active: 2002-2023

where 'Filed Patents' based on already Granted Patents

127 patents (USPTO):
1. 11670510 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2023-06-06),
2. 11018007 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2021-05-25),
3. 10957583 - Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs (2021-03-23),
4. 10546774 - Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs (2020-01-28),
5. 10529569 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2020-01-07),
6. 10395985 - Self aligned conductive lines with relaxed overlay (2019-08-27),
7. 10121661 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2018-11-06),
8. 10083864 - Self aligned conductive lines with relaxed overlay (2018-09-25),
9. 9991156 - Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs (2018-06-05),
10. 9972533 - Aligning conductive vias with trenches (2018-05-15),
11. 9934970 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2018-04-03),
12. 9852946 - Self aligned conductive lines (2017-12-26),
13. 9842737 - Self-aligned quadruple patterning process (2017-12-12),
14. 9779944 - Method and structure for cut material selection (2017-10-03),
15. 9773700 - Aligning conductive vias with trenches (2017-09-26),

Title: The Innovative Journey of Matthew Earl Colburn

Introduction: Matthew Earl Colburn, a talented inventor hailing from Hopewell Junction, NY, has made significant contributions to the world of innovations with his creative mind and dedication to problem-solving.

Latest Patents: Matthew Earl Colburn holds several patents in various fields, showcasing his versatility and ingenuity in inventing new solutions to complex challenges.

Career Highlights: Throughout his career, Matthew Earl Colburn has demonstrated a keen ability to identify gaps in the market and develop groundbreaking inventions to fill those voids. His passion for innovation has led to the creation of revolutionary products that have improved the lives of many.

Collaborations: Matthew Earl Colburn has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Matthew Earl Colburn stands as a shining example of an inventor who has made a lasting impact on the world through his innovative spirit and dedication to pushing the boundaries of what is possible. His contributions to the field of inventions will continue to inspire future generations of inventors to think outside the box and pursue their creative visions.

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