Masanori Numano

Title: Innovations by Masanori Numano in Semiconductor Manufacturing

Introduction

Masanori Numano is a notable inventor based in Yokohama, Japan. With a total of nine patents to his name, he has made significant contributions to the field of semiconductor manufacturing. His work focuses primarily on enhancing the efficiency and reliability of semiconductor devices.

Latest Patents

Among his latest innovations, Numano developed a method for manufacturing a semiconductor device that effectively removes damage layers and native oxide films in connection holes. This intricate process begins with dry-etching an insulating film formed on a conducting layer to create a connection hole. Plasma is then supplied to the exposed conducting layer to dry-clean the damage layer that has formed. Following this, a product generated in the connection hole is eliminated through a wet process. Additionally, any oxide film created during this process is subsequently etched via a chemical dry process using gases such as NF or HF. Finally, the thermally decomposable reaction product resulting from the etching phase is removed through heat treatment. This patented method significantly advances semiconductor fabrication techniques.

Career Highlights

Masanori Numano is currently affiliated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His position at such an esteemed organization underscores his expertise and the impact of his work on the semiconductor industry.

Collaborations

Throughout his career, Numano has collaborated with notable colleagues, including Norihiko Tsuchiya and Shuichi Samata. These partnerships have likely enriched his innovative endeavors, allowing for the exchange of ideas and expertise in their shared field.

Conclusion

Masanori Numano's contributions to semiconductor manufacturing are noteworthy, especially through his recent patent innovations. His collaborative efforts and expertise at Kabushiki Kaisha Toshiba highlight his role as a significant inventor in advancing technology within the semiconductor industry. His work not only reflects personal achievement but also plays a crucial role in the ongoing evolution of semiconductor manufacturing processes.