The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2012
Filed:
Sep. 09, 2009
Makoto Honda, Yokohama, JP;
Kaori Yomogihara, Yokohama, JP;
Kazuhiro Murakami, Oita, JP;
Masanori Numano, Yokohama, JP;
Takahito Nagamatsu, Oita, JP;
Hideaki Harakawa, Kawasaki, JP;
Hideto Matsuyama, Yokohama, JP;
Hirokazu Ezawa, Tokyo, JP;
Hisashi Kaneko, Fujisawa, JP;
Makoto Honda, Yokohama, JP;
Kaori Yomogihara, Yokohama, JP;
Kazuhiro Murakami, Oita, JP;
Masanori Numano, Yokohama, JP;
Takahito Nagamatsu, Oita, JP;
Hideaki Harakawa, Kawasaki, JP;
Hideto Matsuyama, Yokohama, JP;
Hirokazu Ezawa, Tokyo, JP;
Hisashi Kaneko, Fujisawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
An insulating film formed on a conducting layer is dry-etched so as to make a connection hole in the insulating film to expose the conducting layer. Plasma is supplied onto the exposed conducting layer to dry-clean a damage layer produced in the connection hole. A product produced in the connection hole as a result of the dry cleaning is removed by a wet process. An oxide film formed in the connection hole as a result of the wet process is etched by a chemical dry process using a gas including either NFor HF. A thermally decomposable reaction product produced as a result of the etching is removed by heat treatment.