Takahito Nagamatsu

Title: Takahito Nagamatsu: Innovator in Ion Implantation Technology

Introduction

Takahito Nagamatsu is a prominent inventor based in Oita, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in ion implantation technology. With a total of 5 patents to his name, Nagamatsu continues to push the boundaries of innovation in his field.

Latest Patents

Nagamatsu's latest patents include an "Ion implantation apparatus and method of determining state of ion implantation apparatus." This invention features an ion implantation unit that scans the surface of a substrate with an ion beam, implanting positively charged ions into the substrate. The apparatus also includes a position detection unit, a charge supply unit, a current value detection unit, and a determination unit to assess the charge build-up state of the substrate.

Another notable patent is the "Method of manufacturing a semiconductor device from which damage layers and native oxide films in connection holes have been removed." This method involves dry-etching an insulating film to create a connection hole, followed by plasma treatment to clean damage layers and a wet process to remove products formed in the connection hole. The process concludes with a chemical dry etching to eliminate oxide films.

Career Highlights

Nagamatsu is currently employed at Kabushiki Kaisha Toshiba, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of ion implantation processes.

Collaborations

Some of his notable coworkers include Yukio Nishiyama and Rempei Nakata, who have collaborated with him on various projects within the semiconductor field.

Conclusion

Takahito Nagamatsu is a key figure in the realm of semiconductor innovation, with a focus on ion implantation technology. His contributions continue to shape the future of semiconductor manufacturing, making him a valuable asset to the industry.