Yokohama, Japan

Hideto Matsuyama


Average Co-Inventor Count = 4.1

ph-index = 5

Forward Citations = 463(Granted Patents)


Location History:

  • Kanagawa, JP (2010 - 2011)
  • Harrison, NY (US) (2011)
  • Yokohama, JP (2000 - 2012)

Company Filing History:


Years Active: 2000-2012

Loading Chart...
10 patents (USPTO):Explore Patents

Title: Innovations of Hideto Matsuyama

Introduction

Hideto Matsuyama is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on methods of manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

Matsuyama's latest patents include a method of manufacturing a semiconductor device that effectively removes damage layers and native oxide films in connection holes. This innovative process involves dry-etching an insulating film to create a connection hole that exposes a conducting layer. Plasma is then supplied to dry-clean the damage layer produced in the connection hole. Following this, a wet process is used to remove any products created during the dry cleaning. Additionally, an oxide film formed in the connection hole is etched using a chemical dry process with gases such as NF or HF. The thermally decomposable reaction product resulting from the etching is subsequently removed through heat treatment. Another notable patent involves a method of manufacturing a semiconductor device that includes providing an insulating film above a semiconductor substrate and forming a silicon oxide film through dehydration condensation.

Career Highlights

Hideto Matsuyama is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to develop and refine his innovative methods in semiconductor manufacturing, contributing to the advancement of the industry.

Collaborations

Matsuyama has collaborated with notable colleagues such as Yoshihiko Nakano and Rikako Kani. Their combined expertise has further enhanced the research and development efforts in semiconductor technology.

Conclusion

Hideto Matsuyama's contributions to semiconductor manufacturing through his innovative patents have significantly impacted the technology landscape. His work continues to influence advancements in the field, showcasing the importance of innovation in driving progress.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…