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For the Inventor, By the Inventor

Nirasaki, Japan

Masaki Kondo

This inventor holds 11 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 1993-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaki Kondo. Retrieved from https://idiyas.com/inventor/masaki-kondo-3vuwvljd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 11 

% Patents Active = 63.6

Average Co-Inventor Count = 1.7

ph-index = 6

Forward Citations = 264(Granted Patents)


Location History:

  • Yamanashi, JP (1995)
  • Kofu, JP (1996)
  • Nirasaki, JP (1993 - 2013)
  • Miyagi, JP (2017 - 2018)

Company Filing History:

goldMedal11 out of 10,933 
 
Tokyo Electron Limited
 patents

Years Active: 1993-2018

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11 patents (USPTO):Explore Patents
1. 9905485 - Method of monitoring output intensity of laser beam in bevel etching apparatus (2018-02-27),
2. 9623516 - Etching method and bevel etching apparatus (2017-04-18),
3. 9618493 - Substrate processing apparatus and method for detecting an abnormality of an ozone gas concentration (2017-04-11),
4. 8506718 - Polymer removing apparatus and method (2013-08-13),
5. 8454752 - Foreign substance removing apparatus, foreign substance removing method, and storage medium (2013-06-04),
6. 7993458 - Vacuum processing apparatus and method (2011-08-09),
7. D552138 - Arm transferring substrate to be processed (2007-10-02),
8. 6522942 - Transfer apparatus for semiconductor process (2003-02-18),
9. 5557215 - Self-bias measuring method, apparatus thereof and electrostatic chucking (1996-09-17),
10. 5460684 - Stage having electrostatic chuck and plasma processing apparatus using (1995-10-24),
11. 5179498 - Electrostatic chuck device (1993-01-12),

Title: Masaki Kondo: Innovator in Laser Etching Technology

Introduction

Masaki Kondo is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of laser etching technology, holding a total of 11 patents. His innovative methods have advanced the efficiency and effectiveness of laser beam applications in various industrial processes.

Latest Patents

Kondo's latest patents include a "Method of monitoring output intensity of laser beam in bevel etching apparatus." This patent discloses an etching processing method that utilizes a bevel etching apparatus for etching substrates by irradiating them with a laser beam. The apparatus comprises a laser generator and an image capturing unit. The method involves capturing an image of the inner part of a processing container illuminated by scattered light from the laser beam. It also includes calculating the brightness of a predetermined area within the captured image and monitoring the output value of the laser beam based on the calculated brightness.

Another notable patent is the "Etching method and bevel etching apparatus." This invention describes an etching method that employs a bevel etching apparatus designed to etch substrates by emitting a laser beam. The apparatus includes a laser generator and a power meter that measures the laser beam output. The method entails irradiating the power meter with the laser beam for a specified duration before etching the substrate, ensuring that the measured output value falls within predetermined thresholds.

Career Highlights

Masaki Kondo is currently associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has been instrumental in enhancing the capabilities of laser etching technologies, making significant strides in precision and control.

Collaborations

Kondo has collaborated with notable colleagues, including Hiroaki Saeki and Takehiro Shindou. Their combined expertise has contributed to the development of innovative solutions in laser technology.

Conclusion

Masaki Kondo's contributions to laser etching technology exemplify the impact of innovation in industrial processes. His patents reflect a commitment to advancing technology and improving efficiency in manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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