The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1993
Filed:
Apr. 19, 1991
Applicant:
Inventors:
Toshiaki Hongoh, Yamanashi, JP;
Masaki Kondo, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H02N / ;
U.S. Cl.
CPC ...
361234 ; 269-8 ; 269903 ; 279128 ;
Abstract
The present invention provides an electrostatic chuck device with a strong chucking force for use in an ion injection apparatus, an etching apparatus, a sputtering apparatus, an CVD apparatus, etc., which require electrostatic chucking. The chuck device is capable of easily loading/unloading an object to be chucked and providing sure grounding for a semiconductor wafer. To this purpose, three-phase AC voltages of 1 Hz or less with different phases are applied, and contact pins with pointed tips are provided.