The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Dec. 10, 2014
Substrate processing apparatus and method for detecting an abnormality of an ozone gas concentration
Tokyo Electron Limited, Tokyo, JP;
Masaki Kondo, Miyagi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus is provided that includes an ozonizer for generating ozone gas and an ozone sensor for detecting an ozone gas concentration. The substrate processing apparatus processes a substrate by using the ozone gas supplied from the ozonizer. The substrate processing apparatus includes a monitor unit for monitoring the ozone gas concentration detected by the ozone sensor and a control unit for detecting an abnormality of the ozone gas concentration based on the monitored ozone gas concentration and the monitored discharge power.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile