Tokyo, Japan

Masahito Mori

This inventor holds 62 USPTO granted patents and 7 published patent applications and 10 EPO patents, primarily in Plasma Processing. Top assignees: Hitachi-High-Technologies Corporation, Sony Corporation, Hitachi, Ltd.. Active years: 1982-2025.

USPTO Granted Patents = 62 

% Patents Active = 88.7

 

Average Co-Inventor Count = 3.1

ph-index = 13

Forward Citations = 433(Granted Patents)

Forward Citations (Not Self Cited) = 415(Dec 10, 2025)


Location History:

  • Hadano, JP (1982)
  • Shizuoka, JP (1986)
  • Odawara, JP (1986 - 1987)
  • Kokubunji, JP (1999 - 2005)
  • Hachioji, JP (2004 - 2005)
  • Tokorozawa, JP (2008 - 2018)
  • Kudamatsu, JP (2018)
  • Kanagawa, JP (1998 - 2023)
  • Tokyo, JP (1999 - 2024)

Company Filing History:


Years Active: 1982-2025

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Areas of Expertise:
Plasma Processing Apparatus
Wireless Communication Device
Plasma Etching
Radio Resource Management
Content Supply Method
Information Processing
Dry Etching
Data Management
Electrode Plate
Communication Control
Program
Transmission Method
62 patents (USPTO):Explore Patents

Title: Innovations of Masahito Mori: A Pioneer in Plasma Processing Technology

Introduction

Masahito Mori, based in Tokyo, Japan, is a distinguished inventor with an impressive portfolio of 39 patents. His innovative contributions to the field of plasma processing have made significant impacts on various technologies, particularly in the etching of silicon films.

Latest Patents

Mori's latest innovations include cutting-edge patents focusing on plasma processing methods. One such innovation is a plasma processing method that enhances plasma etching for silicon films or polysilicon films containing boron. By utilizing a mixed gas of a halogen gas, a fluorine-containing gas, and boron trichloride gas, this method improves the etching rate and reduces etching defects.

Additionally, Mori has developed a sophisticated plasma processing apparatus designed to implement a specific plasma etching method that improves tapered shapes. This apparatus consists of a processing chamber, a dual radio frequency power source setup, and a control unit that precisely manages the etching process, effectively handling a stacked film configuration of silicon oxide and polycrystalline silicon or silicon nitride films through a generated plasma from a mixed gas of hydrogen bromide, hydrofluorocarbon, and nitrogen element-containing gases.

Career Highlights

Mori has played a vital role in several reputable organizations, including Hitachi High Technologies Corporation and Hitachi, Ltd. His extensive experience and knowledge in plasma processing technologies have established him as a key figure in the field.

Collaborations

Throughout his career, Masahito Mori has collaborated with other accomplished professionals, including Takao Arase and Kenetsu Yokogawa. These collaborations have further fueled innovation and development in plasma processing technologies.

Conclusion

Masahito Mori's contributions to innovations in plasma processing underscore his status as a leading inventor in the field. With his extensive patent portfolio and the collaborative efforts with other experts, Mori continues to push the boundaries of technology, unlocking new possibilities and advancing industrial processes.

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