The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Jul. 30, 2013
Hitachi High-technologies Corporation, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
A plasma processing apparatus having a stable plasma generation under wide-ranging process conditions, and superior in uniformity and reproducibility, comprises an upper electrodehaving gas supply through holes, a gas supply means and a lower electrode, wherein the gas supply means includes a plane-like memberhaving gas through holesand a plane-like memberhaving gas through holes, and the gas supply through holesand the gas through holesare connected through a groove, and the gas through holesand the gas through holesare connected through a groove, and wherein the gas supply through holes, the gas through holesand the gas through holesare disposed at positions, different from each other on a plane.