Fuchu, Japan

Masahito Ishihara


Average Co-Inventor Count = 3.3

ph-index = 7

Forward Citations = 197(Granted Patents)


Location History:

  • Tokyo, JP (1999 - 2006)
  • Fuchu, JP (1997 - 2020)

Company Filing History:


Years Active: 1997-2020

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):

Title: Masahito Ishihara: Innovator in Deposition Technology

Introduction

Masahito Ishihara is a prominent inventor based in Fuchu, Japan. He has made significant contributions to the field of deposition technology, holding a total of 13 patents. His work focuses on improving the efficiency and effectiveness of deposition apparatuses and electrostatic chuck devices.

Latest Patents

One of Ishihara's latest patents is a deposition apparatus designed to enhance the film formation process on substrates. This apparatus includes a chamber, a holding unit for the substrate, a driving unit for movement, a deposition unit for applying the deposition material, and a cooling unit to maintain optimal conditions. Another notable patent is for an electrostatic chuck device that features a dielectric plate with embossed projections. This device ensures that the substrate's back and the conductor wiring maintain the same potential during processing, which minimizes particle generation and enhances substrate handling.

Career Highlights

Throughout his career, Masahito Ishihara has worked with notable companies such as Anelva Corporation and Canon Anelva Corporation. His experience in these organizations has allowed him to develop innovative solutions that address challenges in the deposition process.

Collaborations

Ishihara has collaborated with esteemed colleagues, including Shigeru Mizuno and Sunil Wickramanayaka. These partnerships have contributed to the advancement of technology in their respective fields.

Conclusion

Masahito Ishihara's contributions to deposition technology and his innovative patents have significantly impacted the industry. His work continues to influence advancements in substrate processing and electrostatic chuck devices.

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