The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Jun. 24, 2004
Applicants:
Sunil Wickramanayaka, Tama, JP;
Masahito Ishihara, Fuchu, JP;
Yoshikazu Nozaki, Palo Alto, CA (US);
Hiroshi Doi, Chofu, JP;
Inventors:
Sunil Wickramanayaka, Tama, JP;
Masahito Ishihara, Fuchu, JP;
Yoshikazu Nozaki, Palo Alto, CA (US);
Hiroshi Doi, Chofu, JP;
Assignee:
Anelva Corporation, Fuchu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/503 (2006.01); C23C 16/00 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plasma processing system includes a reactor, a top electrode made of a magnetic or ferromagnetic metal or a metal-alloy, wherein a RF or DC power is applied to generate plasma within the reactor; a gas showerhead fixed to the top electrode; a sheet-like magnetic assembly bound to the upper surface of the gas showerhead, which includes a plurality of separate magnets, a metal sheet made of a ferromagnetic metal, and a deformable film.