This inventor holds 2 USPTO granted patents. Top assignee: Anelva Corporation. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Innovations by Yoshikazu Nozaki
Introduction
Yoshikazu Nozaki is a notable inventor based in Palo Alto, CA, who has made significant contributions to the field of plasma processing systems. With a total of 2 patents, his work focuses on enhancing the efficiency and functionality of various components used in these systems.
Latest Patents
One of his latest patents is a "Wafer stage with a magnet." This invention involves a wafer stage designed to hold a wafer within a plasma processing chamber. The stage includes an electrode that supplies electrical current to the wafer, with a diameter larger than that of the wafer itself. Additionally, a series of magnets are strategically arranged on the outermost region of the electrode, with alternate magnetic poles facing inward. An outer ring surrounds the wafer, featuring a magnetic metal ring on its lower side.
Another significant patent is the "Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems." This invention pertains to a plasma processing system that includes a reactor and a top electrode made from magnetic or ferromagnetic materials. The system generates plasma within the reactor, and it features a gas showerhead fixed to the top electrode. A magnetic assembly, which consists of separate magnets, a ferromagnetic metal sheet, and a deformable film, is bound to the upper surface of the gas showerhead.
Career Highlights
Yoshikazu Nozaki is currently employed at Anelva Corporation, where he continues to innovate and develop advanced technologies in plasma processing. His work has been instrumental in improving the performance and reliability of plasma systems.
Collaborations
Throughout his career, Nozaki has collaborated with talented individuals such as Sunil Wickramanayaka and Masahito Ishihara, contributing to a dynamic and innovative work environment.
Conclusion
Yoshikazu Nozaki's contributions to the field of plasma processing systems through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile