The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Feb. 19, 2005
Applicants:
Sunil Wickramanayaka, Tokyo, JP;
Yoshikazu Nozaki, Palo Alto, CA (US);
Inventors:
Sunil Wickramanayaka, Tokyo, JP;
Yoshikazu Nozaki, Palo Alto, CA (US);
Assignee:
Anelva Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01T 23/00 (2006.01); H01L 21/00 (2006.01); H01L 21/302 (2006.01); H01L 21/461 (2006.01); H01L 31/306 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A wafer stage for holding a wafer in a chamber of a plasma processing system, the wafer stage includes an electrode on which a wafer is placed, to which electrical current is supplied, a diameter of the electrode is larger than a diameter of said wafer, a plurality of magnets separately arranged on an outermost region of said electrode and said magnets are arranged such that alternate magnetic poles face towards the inside of the chamber, and an outer-ring placed around said wafer, the outer ring having a magnetic metal ring at a lower side.