The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 1999
Filed:
Sep. 16, 1997
Applicant:
Inventors:
Masahiko Kobayashi, Kanagawa, JP;
Masahito Ishihara, Fuchu, JP;
Hajime Sahase, Fuchu, JP;
Nobuyuki Takahashi, Sagamihara, JP;
Assignee:
Anelva Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2042982 ; 20429819 ;
Abstract
A sputtering apparatus is provided with a magnetic assembly which is rotated and revolved, and the eccentric distance between the rotation axis and the revolution axis is varied. By this arrangement, erosion profile of a target is made uniform, whereby a uniform thin film is deposited on a substrate surface.
Kobayashi, Masahiko. (1999). Sputtering apparatus (U.S. Patent No. 5944968). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5944968
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile