The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2020
Filed:
Apr. 06, 2017
Applicant:
Canon Anelva Corporation, Kawasaki-shi, Kanagawa-ken, JP;
Inventors:
Naoyuki Nozawa, Inagi, JP;
Nobuo Matsuki, Kawasaki, JP;
Reiji Sakamoto, Hino, JP;
Masahito Ishihara, Fuchu, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki-Shi, Kanagawa-Ken, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/50 (2006.01); C23C 14/56 (2006.01); C23C 14/34 (2006.01); C23C 14/54 (2006.01); H01J 37/34 (2006.01); C23C 14/04 (2006.01); C23C 14/02 (2006.01); H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 14/50 (2013.01); C23C 14/022 (2013.01); C23C 14/04 (2013.01); C23C 14/3464 (2013.01); C23C 14/541 (2013.01); C23C 14/566 (2013.01); C23C 14/568 (2013.01); H01J 37/3411 (2013.01); H01J 37/3488 (2013.01); H01L 21/6776 (2013.01); H01L 21/67109 (2013.01); H01L 21/67201 (2013.01); H01L 21/67213 (2013.01); H01L 21/67712 (2013.01);
Abstract
A deposition apparatus includes a chamber, a holding unit configured to hold a substrate in the chamber, a driving unit configured to move the holding unit holding the substrate such that the substrate passes through a deposition area in the chamber, a deposition unit configured to form a film on the substrate passing through the deposition area by supplying a deposition material to the deposition area, and a cooling unit configured to cool the holding unit.