Kawasaki, Japan

Nobuo Matsuki

This inventor holds 1 USPTO granted patent. Top assignee: Canon Anelva Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuo Matsuki. Retrieved from https://idiyas.com/inventor/nobuo-matsuki-o2nekh0y

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Nobuo Matsuki: Innovator in Deposition Technology

Introduction

Nobuo Matsuki is a prominent inventor based in Kawasaki, Japan. He is known for his contributions to the field of deposition technology, particularly through his innovative patent that enhances the efficiency of film formation on substrates.

Latest Patents

Matsuki holds a patent for a deposition apparatus. This apparatus includes a chamber, a holding unit designed to hold a substrate, a driving unit that moves the holding unit to allow the substrate to pass through a deposition area, a deposition unit that forms a film on the substrate by supplying a deposition material, and a cooling unit to maintain optimal temperatures during the process. He has 1 patent to his name.

Career Highlights

Matsuki is associated with Canon Anelva Corporation, where he has made significant strides in the development of advanced deposition technologies. His work has contributed to the company's reputation as a leader in the field.

Collaborations

Matsuki has collaborated with notable colleagues, including Reiji Sakamoto and Masahito Ishihara. Their combined expertise has fostered innovation and progress within their projects.

Conclusion

Nobuo Matsuki's contributions to deposition technology exemplify the spirit of innovation. His work continues to influence advancements in the field, showcasing the importance of collaboration and creativity in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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