Canon Anelva Corporation

Nobuo Matsuki

Masahito Ishihara

Naoyuki Nozawa

Reiji Sakamoto

A deposition apparatus includes a chamber, a holding unit configured to hold a substrate in the chamber, a driving unit configured to move the holding unit holding the substrate such that the substrate passes through a deposition area in the chamber, a deposition unit configured to form a film on the substrate passing through the deposition area by supplying a deposition material to the deposition area, and a cooling unit configured to cool the holding unit.

Growing community of inventors

Kawasaki, Japan

Nobuo Matsuki