Company Filing History:
Years Active: 2013-2024
Title: Masahisa Okuno: Innovator in Substrate Processing Technology
Introduction
Masahisa Okuno is a prominent inventor based in Toyama, Japan, known for his significant contributions to substrate processing technology. With a total of 10 patents to his name, Okuno has made remarkable advancements in the field of semiconductor manufacturing.
Latest Patents
One of his latest patents is a substrate processing apparatus that includes a process chamber for accommodating a substrate. This apparatus features a vaporizer that vaporizes a liquid precursor to generate reaction gas and deliver a processing gas containing the reaction gas and a carrier gas. The vaporizer consists of a vaporization vessel and a heater that heats the liquid precursor. Additionally, it includes a carrier gas flow rate controller, a liquid precursor flow rate controller, a processing gas supply pipe, and a gas concentration sensor to detect the gas concentration of the reaction gas.
Another notable patent involves a method of manufacturing a semiconductor device and a recording medium. This technique includes modifying a film containing a silazane bond by heating a substrate and supplying a processing gas containing hydrogen peroxide. The process consists of two acts, with the second act involving heating the substrate to a higher temperature and supplying a second processing gas.
Career Highlights
Throughout his career, Masahisa Okuno has worked with leading companies in the industry, including Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His expertise in substrate processing has positioned him as a key figure in the development of innovative technologies.
Collaborations
Okuno has collaborated with notable coworkers such as Takuya Joda and Hideto Tateno, contributing to various projects that have advanced the field of semiconductor manufacturing.
Conclusion
Masahisa Okuno's contributions to substrate processing technology and his impressive portfolio of patents highlight his role as an influential inventor in the semiconductor industry. His work continues to impact the development of advanced manufacturing techniques.