The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Sep. 22, 2011
Tokunobu Akao, Toyama, JP;
Unryu Ogawa, Toyama, JP;
Masahisa Okuno, Toyama, JP;
Shinji Yashima, Toyama, JP;
Atsushi Umekawa, Toyama, JP;
Kaichiro Minami, Toyama, JP;
Tokunobu Akao, Toyama, JP;
Unryu Ogawa, Toyama, JP;
Masahisa Okuno, Toyama, JP;
Shinji Yashima, Toyama, JP;
Atsushi Umekawa, Toyama, JP;
Kaichiro Minami, Toyama, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
A substrate processing apparatus includes a processing chamber configured to process a substrate, a substrate support member provided within the processing chamber to support the substrate, a microwave generator provided outside the processing chamber, a waveguide launch port configured to supply a microwave generated by the microwave generator into the processing chamber, wherein the central position of the waveguide launch port is deviated from the central position of the substrate supported on the substrate support member and the waveguide launch port faces a portion of a front surface of the substrate supported on the substrate support member, and a control unit configured to change a relative position of the substrate support member in a horizontal direction with respect to the waveguide launch port.