Toyama, Japan

Masahisa Endo

USPTO Granted Patents = 10 


Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019-2023

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10 patents (USPTO):Explore Patents

Title: The Innovative Mind of Masahisa Endo

Introduction

Masahisa Endo is a notable inventor based in Toyama, Japan. With a remarkable portfolio of 10 patents to his name, he has significantly contributed to advancements in materials science and engineering, particularly in the field of lithography and chemical compositions.

Latest Patents

One of Endo's recent patents is focused on a composition for forming silicon-containing resist underlayer film that is removable by a wet process. This innovation involves a resist underlayer film-forming composition designed for use as a hard mask, which can be effectively removed using chemical solutions, such as sulfuric acid combined with hydrogen peroxide. The formulation includes a hydrolyzable silane as Component (A), and a cross-linkable compound with a ring structure as Component (B).

Another significant invention by Endo is a method involving a novel thioglycoluril compound. This unique compound includes both monothioglycoluril and dithioglycoluril components, which can provide enhanced properties for various applications in chemical processes and materials.

Career Highlights

Throughout his career, Masahisa Endo has been associated with prominent companies such as Nissan Chemical Corporation and Thin Film Electronics Asa. His role in these organizations has allowed him to engage in cutting-edge research and development initiatives, paving the way for innovative products in the industry.

Collaborations

Endo has collaborated with various experts in his field, including notable coworkers Gun Son and Yuichi Goto. These professional relationships have fostered an environment of creativity and knowledge-sharing, further enhancing the scope and impact of his inventions.

Conclusion

Masahisa Endo exemplifies the spirit of innovation within the technological landscape of Japan. With his extensive patent portfolio and significant contributions to materials science, he continues to inspire aspiring inventors and researchers alike. His work not only advances the field of lithography but also sets a benchmark for future innovations in chemical composition and application.

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