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For the Inventor, By the Inventor

Hayward, CA, United States of America

Mark W Kiehlbauch

This inventor holds 51 USPTO granted patents and 8 published patent applications and 5 EPO patents, primarily in Semiconductor Processing (CPC class H01L). Top assignees: Micron Technology Incorporated, Lam Research Corporation. Active years: 2007-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark W Kiehlbauch. Retrieved from https://idiyas.com/inventor/mark-w-kiehlbauch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 51 

% Patents Active = 94.1

 

Average Co-Inventor Count = 1.6

ph-index = 11

Forward Citations = 416(Granted Patents)

Forward Citations (Not Self Cited) = 400(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hayward, CA (US) (2007 - 2012)
  • Boise, ID (US) (2008 - 2023)

Company Filing History:

goldMedal48 out of 39,222 
 
Micron Technology Incorporated
 patents
silverMedal3 out of 3,945 
 
Lam Research Corporation
 patents

Years Active: 2007-2023

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Areas of Expertise:
Semiconductor Constructions
Memory Cells
Capacitor Forming
Plasma Processing
High Aspect Ratio
Integrated Circuits
Oxide Spacers
Transistor Gates
Lithography
Surface Treatment
Etching Chemistries
Substrate Opening
51 patents (USPTO):Explore Patents
1. 11678477 - Semiconductor constructions, and semiconductor processing methods (2023-06-13),
2. 10879247 - Semiconductor constructions, and semiconductor processing methods (2020-12-29),
3. 10553607 - Method of forming an array of elevationally-extending strings of programmable memory cells and method of forming an array of elevationally-extending strings of memory cells (2020-02-04),
4. 10446578 - Methods used in forming an array of elevationally-extending strings of memory cells, methods of forming an array of elevationally-extending strings of memory cells, and methods of forming an array of vertical strings of memory cells (2019-10-15),
5. 10014301 - Semiconductor constructions (2018-07-03),
6. 9595387 - High aspect ratio openings (2017-03-14),
7. 9443756 - Methods of forming a substrate opening (2016-09-13),
8. 9224798 - Capacitor forming methods (2015-12-29),
9. 9153497 - Semiconductor constructions (2015-10-06),
10. 9090460 - Plasma processing with preionized and predissociated tuning gases and associated systems and methods (2015-07-28),
11. 9005473 - Gaseous compositions comprising hydrogen fluoride and an alkylated ammonia derivative (2015-04-14),
12. 9005463 - Methods of forming a substrate opening (2015-04-14),
13. 8910591 - Apparatus and methods for capacitively coupled plasma vapor processing of semiconductor wafers (2014-12-16),
14. 8853050 - Methods of forming capacitors (2014-10-07),
15. 8772166 - Spacer process for on pitch contacts and related structures (2014-07-08),

Title: The Innovative Journey of Mark W Kiehlbauch

Introduction:

Mark W Kiehlbauch is a renowned inventor hailing from Hayward, California. With a passion for creating groundbreaking solutions, he has made significant contributions to the world of innovation.

Latest Patents:

Mark W Kiehlbauch's latest patents showcase his commitment to pushing the boundaries of technology and design. His recent inventions have garnered attention for their ingenuity and practicality.

Career Highlights:

Throughout his illustrious career, Mark W Kiehlbauch has demonstrated a keen ability to identify gaps in the market and develop unique solutions to address them. His innovative spirit has led to the creation of patents that have improved various industries.

Collaborations:

Mark W Kiehlbauch has collaborated with leading experts in the field to bring his inventions to life. His partnerships have been instrumental in refining his ideas and ensuring their successful implementation in the market.

Conclusion:

In conclusion, Mark W Kiehlbauch stands as a visionary inventor whose dedication to innovation has left a lasting impact on the industry. His inventive prowess continues to inspire others to think outside the box and create solutions that shape the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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