Mark Klare

Title: Mark Klare: Innovator in Non-Destructive Metrology

Mark Klare, based in Poughkeepsie, NY, is a distinguished inventor with a portfolio of eight patents. His contributions are particularly notable in the realm of non-destructive metrology for integrated circuits, advancing the field through innovative methods and systems.

Latest Patents

Among his latest patents is a method and system for non-destructive metrology of thin layers that determines properties of layers in integrated circuits. This innovative approach involves irradiating the integrated circuit (IC) to eject electrons, collecting these electrons, and determining their kinetic energy to calculate the emission intensity from both the layer and the underlying layer. By analyzing the ratio of these emission intensities, researchers can ascertain crucial information about the material composition or thickness of the layer. Furthermore, this technique can be executed using x-ray photoelectron spectroscopy (XPS) or x-ray fluorescence spectroscopy (XRF). Another significant patent follows a similar theme, offering a sophisticated monitoring system that processes data from various measurements to evaluate properties of multi-layered integrated circuits, combining insights from optical, XPS, and XRF measurements.

Career Highlights

Mark has made significant strides in his career, working with notable companies in the field. His experience includes key roles at Nova Measuring Instruments Ltd. and Nova Corporation, where he contributed to the development of groundbreaking technologies that enhance the manufacturing processes of integrated circuits.

Collaborations

Throughout his career, Mark has collaborated with notable peers, including Wei Ti Lee and Heath A Pois. These collaborations have further enriched his work and have fostered innovation in the field of integrated circuit metrology.

Conclusion

Mark Klare stands out as a prominent inventor with a focus on advancing metrology techniques for integrated circuits. His eight patents exemplify his commitment to innovation and contribute to the future of semiconductor technology. With his extensive experience and collaborative efforts, he continues to push the boundaries of what is possible in the realm of integrated circuit measurement and analysis.