Sagamihara, Japan

Manabu Ikemoto


Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 328(Granted Patents)


Location History:

  • Tokyo, JP (2003 - 2004)
  • Kanakgawa-ken, JP (2007)
  • Fuchu, JP (2011)
  • Sagamihara, JP (2002 - 2018)
  • Kawasaki, JP (2010 - 2021)

Company Filing History:


Years Active: 2002-2021

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10 patents (USPTO):Explore Patents

Title: Manabu Ikemoto: Innovator in Hydrogen Absorption Technologies

Introduction

Manabu Ikemoto is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of materials science, particularly in hydrogen absorption technologies. With a total of 10 patents to his name, Ikemoto's work has advanced the understanding and application of various materials in industrial processes.

Latest Patents

Ikemoto's latest patents include a structure and method of manufacturing a unique arrangement of particles containing hydrogen absorption metal elements. This innovative structure ensures that the particles are spaced apart within a fixed member, which is composed of at least one oxide or nitride. Another notable patent is a substrate cleaning method that utilizes radicals generated by plasma to effectively remove oxide films. This method allows for high selectivity in substrate surface treatment, preserving the flatness of the substrate while removing unwanted organic matter.

Career Highlights

Throughout his career, Manabu Ikemoto has worked with notable companies, including Canon Anelva Corporation. His expertise in the field has led to the development of advanced technologies that have practical applications in various industries.

Collaborations

Ikemoto has collaborated with several professionals in his field, including Katsuhisa Yuda and Takuya Seino. These collaborations have contributed to the successful development of his innovative technologies.

Conclusion

Manabu Ikemoto's contributions to hydrogen absorption technologies and substrate cleaning methods highlight his role as a leading inventor in his field. His patents reflect a commitment to advancing materials science and improving industrial processes.

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