The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Mar. 16, 2005
Keiji Ishibashi, Fuchu, JP;
Masahiko Tanaka, Fuchu, JP;
Akira Kumagai, Fuchu, JP;
Manabu Ikemoto, Fuchu, JP;
Katsuhisa Yuda, Tokyo, JP;
Keiji Ishibashi, Fuchu, JP;
Masahiko Tanaka, Fuchu, JP;
Akira Kumagai, Fuchu, JP;
Manabu Ikemoto, Fuchu, JP;
Katsuhisa Yuda, Tokyo, JP;
Canon Anelva Corporation, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A vacuum processing apparatus, including a reactor and a partitioning plate having a plurality of through-holes through which radicals are allowed to pass and separating the reactor into a plasma generating space and a substrate process space, the process, such as a film deposition process, being carried out on a substrate placed in the substrate process space by delivering a gas into the plasma generating space for generating a plasma, producing radicals with the plasma thus generated, and delivering the radicals through the plurality of through-holes on the partitioning plate into the substrate process space. The partitioning plate includes a partitioning body having a plurality of through-holes and a control plate disposed on the plasma generating space side of the partitioning body and having radical passage holes in the positions corresponding to the plurality of through-holes on the partitioning plate.