Makoto Fujikawa is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His innovative work focuses on film forming apparatuses and methods that enhance the manufacturing processes of semiconductor devices.

Latest Patents

Fujikawa's latest patents include a film forming apparatus, a film forming method, and a storage medium. The film forming apparatus features a gas discharge part, an exhaust port, and a rotation mechanism. It is designed to heat the interior of a reaction container to a temperature lower than that of the film forming gas. This innovative design allows the film forming gas to cool by colliding with a gas temperature reducing member before being supplied to substrates. Additionally, his method of manufacturing semiconductor devices involves forming a sacrificial film made of a polymer with a urea bond on the substrate surface, followed by a series of steps to adjust the film thickness and shape before removal.

Career Highlights

Fujikawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work has been instrumental in advancing the technology used in semiconductor devices, making processes more efficient and effective.

Collaborations

Some of his notable coworkers include Tatsuya Yamaguchi and Reiji Niino, who have collaborated with him on various projects within the semiconductor field.

Conclusion

Makoto Fujikawa's contributions to semiconductor technology through his innovative patents and work at Tokyo Electron Limited highlight his importance in the industry. His advancements continue to shape the future of semiconductor manufacturing.

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