The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2020

Filed:

Oct. 19, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Tatsuya Yamaguchi, Nirasaki, JP;

Reiji Niino, Nirasaki, JP;

Syuji Nozawa, Nirasaki, JP;

Makoto Fujikawa, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/20 (2006.01); H01L 51/00 (2006.01); H01L 21/02 (2006.01); H01L 21/768 (2006.01); H01L 21/67 (2006.01); H01L 21/311 (2006.01); H01L 21/3105 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02118 (2013.01); H01L 21/0271 (2013.01); H01L 21/02205 (2013.01); H01L 21/02271 (2013.01); H01L 21/02282 (2013.01); H01L 21/3105 (2013.01); H01L 21/31058 (2013.01); H01L 21/31144 (2013.01); H01L 21/67115 (2013.01); H01L 21/76808 (2013.01); H01L 21/76826 (2013.01); H01L 21/76828 (2013.01);
Abstract

There is provided a method of manufacturing a semiconductor device by performing a process on a substrate, comprising: forming a sacrificial film made of a polymer having a urea bond on a surface of the substrate by supplying a precursor for polymerization onto the surface of the substrate; subsequently, performing a step of changing a sectional shape of the sacrificial film and a step of adjusting a film thickness of the sacrificial film by heating the sacrificial film; subsequently, performing the process on the surface of the substrate; and subsequently, removing the sacrificial film.


Find Patent Forward Citations

Loading…