The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Feb. 26, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Kippei Sugita, Nirasaki, JP;
Tatsuya Yamaguchi, Nirasaki, JP;
Yoshinori Morisada, Nirasaki, JP;
Makoto Fujikawa, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09D 179/08 (2006.01); H01L 21/67 (2006.01); C08G 73/10 (2006.01); C23C 16/30 (2006.01); C23C 16/56 (2006.01); H01L 21/3105 (2006.01); B05D 1/00 (2006.01); B05D 3/02 (2006.01); H01L 21/3065 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C09D 179/08 (2013.01); C08G 73/105 (2013.01); C08G 73/1071 (2013.01); C23C 16/30 (2013.01); C23C 16/56 (2013.01); H01L 21/67109 (2013.01); B05D 1/60 (2013.01); B05D 3/0254 (2013.01); H01L 21/02063 (2013.01); H01L 21/3065 (2013.01); H01L 21/31058 (2013.01);
Abstract
A method for improving a chemical resistance of a polymerized film, which is formed on a surface of a target object and to be processed by a chemical, includes: consecutively performing a treatment for improving the chemical resistance of the polymerized film subsequent to formation of the polymerized film within a processing chamber of a film forming apparatus where the polymerized film is formed, without unloading the target object from the processing chamber.