Fujian, China

Linshan Yuan


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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4 patents (USPTO):Explore Patents

Title: Innovations of Linshan Yuan: Pioneering Semiconductor Technologies

Introduction

Linshan Yuan, a renowned inventor based in Fujian, China, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of four patents, his innovative approaches have been pivotal in advancing semiconductor device fabrication processes.

Latest Patents

One of Yuan's latest patents is titled "Method for Making Semiconductor Device Using a Stress Memorization Technique". This invention discloses a novel method of fabricating semiconductor devices that involves a substrate with at least one metal-oxide-semiconductor (MOS) transistor. The technique utilizes a stress memorization technique (SMT) process that includes the steps of depositing an SMT film over the MOS transistor, conducting a thermal process on the film, and applying lithographic and etching processes to achieve a patterned SMT film. This innovative approach facilitates the formation of a silicide layer on the MOS transistor, enhancing the overall performance of semiconductor devices.

Another significant patent by Yuan is "Semiconductor Testkey Pattern and Test Method Thereof". This invention pertains to a semiconductor testkey pattern comprising a high-density device region surrounded by multiple resistor pairs. Each pair features two mutually symmetrical resistor patterns, showcasing Yuan's expertise in improving semiconductor testing methodologies.

Career Highlights

Linshan Yuan is currently affiliated with United Semiconductor (Xiamen) Co., Ltd., where he continues to innovate and develop cutting-edge solutions for the semiconductor industry. His work at this company emphasizes his commitment to advancing technology and enhancing the efficiency of semiconductor devices.

Collaborations

Throughout his career, Yuan has collaborated with various professionals, including notable coworkers Guang Yang and Wen Yi Tan. These collaborations have undoubtedly contributed to the successful execution of his projects and the development of his patents.

Conclusion

In summary, Linshan Yuan is a prominent figure in the semiconductor industry, whose patents and collaborative efforts demonstrate his dedication to innovation. His advancements in semiconductor device fabrication are poised to influence the future of technology, reflecting the essence of modern innovation in the field.

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