Ling-Fu Nieh

Title: Ling-Fu Nieh: Innovator in Semiconductor Technology

Introduction

Ling-Fu Nieh is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on developing innovative solutions for cleaning semiconductor devices and enhancing their manufacturing processes.

Latest Patents

Nieh's latest patents include a semiconductor device cleaning solution, method of use, and method of manufacture. This cleaning solution is designed to effectively clean the surface of semiconductor devices. In one embodiment, a material is polished away from the first surface of the semiconductor device, which is then cleaned using the innovative cleaning solution. The solution comprises a host with at least one ring, featuring a hydrophilic exterior and a hydrophobic interior. Another notable patent involves semiconductor devices formed using multiple planarization processes. This patent outlines methods for creating semiconductor devices that include a substrate and a dielectric layer, with conductive features of varying material layers.

Career Highlights

Ling-Fu Nieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approach have positioned him as a key player in advancing semiconductor technology.

Collaborations

Nieh has collaborated with notable colleagues, including Chun-Wei Hsu and Pinlei Edmund Chu. Their combined efforts contribute to the ongoing development of cutting-edge semiconductor solutions.

Conclusion

Ling-Fu Nieh's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to pave the way for advancements in semiconductor manufacturing and cleaning solutions.