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For the Inventor, By the Inventor

San Jose, CA, United States of America

Li Xu

This inventor holds 33 USPTO granted patents and 4 published patent applications, primarily in Semiconductor Processing. Top assignees: Applied Materials, Inc., Other. Active years: 2002-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Li Xu. Retrieved from https://idiyas.com/inventor/li-xu-bo3ooql2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33 

% Patents Active = 51.5

Average Co-Inventor Count = 4.1

ph-index = 14

Forward Citations = 831(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2002 - 2013)
  • San Jose, CA (US) (2002 - 2022)

Company Filing History:

goldMedal32 out of 14,433 
 
Applied Materials, Inc.
 patents
silverMedal1 out of 834,453 
Other
 patents

Years Active: 2002-2022

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Areas of Expertise:
Yttrium Oxide
Zirconium Oxide
Plasma Resistance
Ceramic Apparatus
Semiconductor Chamber
Erosion Resistance
Thermal Oxide Coating
Anodized Recovery
Solar Cell Fabrication
Electroplating
Contaminant Removal
CIGS Material
33 patents (USPTO):Explore Patents
1. 11373882 - Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide (2022-06-28),
2. 10847386 - Method of forming a bulk article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide (2020-11-24),
3. 10840113 - Method of forming a coated article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide (2020-11-17),
4. 10840112 - Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide (2020-11-17),
5. 10622194 - Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance (2020-04-14),
6. 10242888 - Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance (2019-03-26),
7. 9051219 - Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide (2015-06-09),
8. 9012030 - Process chamber component having yttrium—aluminum coating (2015-04-21),
9. 8758858 - Method of producing a plasma-resistant thermal oxide coating (2014-06-24),
10. 8623527 - Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide (2014-01-07),
11. 8367924 - Buried insulator isolation for solar cell contacts (2013-02-05),
12. 8231736 - Wet clean process for recovery of anodized chamber parts (2012-07-31),
13. 8168462 - Passivation process for solar cell fabrication (2012-05-01),
14. 8129029 - Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating (2012-03-06),
15. 8114525 - Process chamber component having electroplated yttrium containing coating (2012-02-14),

Title: Innovations of Li Xu: A Pioneer in Semiconductor Technology

Introduction

Li Xu, based in San Jose, California, is a prolific inventor holding 33 patents to his name. His contributions primarily focus on advancements in the semiconductor industry, particularly through the development of innovative ceramic articles and coatings. These inventions play a crucial role in enhancing semiconductor processing and reliability.

Latest Patents

Among his latest patents, Li Xu has developed a ceramic article and semiconductor chamber apparatus made from yttrium oxide and zirconium oxide. This innovative coating is specifically engineered to resist erosion from halogen-containing plasmas. By combining these two materials, his inventions aim to improve the durability and efficiency of semiconductor processing equipment.

Career Highlights

Li Xu has made significant strides in his career, having worked with renowned companies such as Applied Materials, Inc. His expertise has greatly contributed to the advancements in semiconductor technologies, ensuring better performance and longevity in various applications.

Collaborations

Throughout his career, Li has collaborated with notable professionals in the industry, including Jennifer Y. Sun and Ren-Guan Duan. Their collective efforts have driven innovation and excellence in semiconductor research and development.

Conclusion

Li Xu's contributions to the field of semiconductor technology showcase his dedication to innovation and excellence. His extensive patent portfolio reflects a significant impact on industry standards and practices, cementing his status as a key figure in semiconductor processing advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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