Li Wu

Title: The Innovative Contributions of Li Wu

Introduction

Li Wu is a prominent inventor based in Fremont, California, known for his significant contributions to the field of semiconductor technology. With a total of nine patents to his name, Wu has made remarkable advancements in cleaning systems for semiconductor components. His work has been instrumental in enhancing the efficiency and effectiveness of these systems.

Latest Patents

One of Li Wu's latest patents is an integrated semiconductor part cleaning system. This invention relates to chamber component cleaning systems and methods designed to clean chamber components effectively. The system includes a spray station, a first cleaning station, a dry station, a component transfer mechanism, and enclosures that house these components. The spray station is equipped with a holder that positions the chamber component in the path of a cleaning spray, while a movable nozzle delivers the spray at a specified pressure. Additionally, the first cleaning station utilizes a push mechanism to force cleaning fluid through the features and holes of the chamber component, complemented by a movable transducer that provides ultrasonic energy.

Another notable patent involves exemplary semiconductor chamber component cleaning systems that feature a receptacle with a bottom lid designed as an annulus. This annulus is characterized by an inner and outer annular wall, with recessed annular ledges defined between them. The cleaning systems also include a top lid that is removably coupled with the bottom lid, along with a tank that defines a volume to receive the receptacle.

Career Highlights

Li Wu has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. and Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to the advancement of semiconductor cleaning technologies.

Collaborations

Throughout his career, Li Wu has collaborated with notable colleagues, including David Walter Groechel and Mei Yin Chang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Li Wu's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence the development of efficient cleaning systems for semiconductor components, showcasing the importance of innovation in technology.