The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2023

Filed:

Oct. 22, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Katty Guyomard, Los Altos, CA (US);

Chidambara A. Ramalingam, Fremont, CA (US);

Shawyon Jafari, Sunnyvale, CA (US);

Palash Joshi, Bangalore, IN;

Moin Ahmed Khan, Bangalore, IN;

Kirubanandan Naina Shanmugam, Bangalore, IN;

Subhaschandra Shreepad Salkod, Bangalore, IN;

Avishek Ghosh, Espoo, FI;

David W. Groechel, Sunnyvale, CA (US);

Li Wu, Fremont, CA (US);

Dorothea Buechel-Rimmel, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); B08B 3/048 (2013.01);
Abstract

Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.


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