The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2006
Filed:
May. 31, 2000
LI Wu, Fremont, CA (US);
Sourabh Mishra, Campbell, CA (US);
Young J. Paik, Campbell, CA (US);
Satyasrayan Kumaraswamy, Sunnyvale, CA (US);
Robert Lum, Sunnyvale, CA (US);
Chiu Chan, Foster City, CA (US);
David Groechel, Sunnyvale, CA (US);
Li Wu, Fremont, CA (US);
Sourabh Mishra, Campbell, CA (US);
Young J. Paik, Campbell, CA (US);
Satyasrayan Kumaraswamy, Sunnyvale, CA (US);
Robert Lum, Sunnyvale, CA (US);
Chiu Chan, Foster City, CA (US);
David Groechel, Sunnyvale, CA (US);
Applied Materials, Santa Clara, CA (US);
Abstract
Generally, a method and apparatus for processing a substrate. In one embodiment, the method provides a first relative motion between at least a first substrate and a polishing material. A second relative motion is provided between at least a second substrate and the polishing material. The changing in direction of the relative motion extends the interval between conditioning procedures used to return the polishing material to a state that produces uniform polishing results.