Li Te Hsu

Title: Innovations by Inventor Li Te Hsu

Introduction

Li Te Hsu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of image sensor devices and chemical processing systems.

Latest Patents

One of his latest patents is titled "Backside illuminated image sensor device having an oxide film and method of forming an oxide film of a backside illuminated image sensor device." This patent discloses a method for fabricating an image sensor device, particularly a backside illuminated (BSI) image sensor. The method involves forming a dielectric film in a radiation-absorption region without the use of conventional plasma etching, which can cause surface roughness and non-uniformity. The process includes providing layers with a substrate that has radiation sensors, an anti-reflective layer, a sacrificial dielectric layer, and a conductive layer. The sacrificial dielectric layer is removed using a highly selective etching process, allowing for precise control over the thickness of the dielectric film.

Another notable patent is the "Method and system for improving wet chemical bath process stability and productivity in semiconductor manufacturing." This innovation utilizes a dynamic spiking model to monitor chemical concentration in the processing bath continuously. It adds fresh chemicals regularly to maintain desirable concentration levels, ensuring that etch rates and selectivities remain optimal while avoiding contamination from undesirable precipitation.

Career Highlights

Li Te Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has significantly impacted the development of advanced semiconductor technologies, enhancing the performance and reliability of various devices.

Collaborations

Throughout his career, Li has collaborated with several talented individuals, including his coworkers Pin Chia Su and Chia-Tsung Tso. These collaborations have fostered innovation and contributed to the success of their projects.

Conclusion

Li Te Hsu's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry, paving the way for future developments in image sensor devices and chemical processing systems.