The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Dec. 21, 2007
Tai-yung Yu, Rende Township, TW;
Yu-sheng Su, Tainan, TW;
LI Te Hsu, Shanhua Township, TW;
Jin Lin Liang, Alian Township, TW;
Shih Cheng Yeh, Linbian Township, TW;
Pin Chia Su, Shanhua Township, TW;
Tai-Yung Yu, Rende Township, TW;
Yu-Sheng Su, Tainan, TW;
Li Te Hsu, Shanhua Township, TW;
Jin Lin Liang, Alian Township, TW;
Shih Cheng Yeh, Linbian Township, TW;
Pin Chia Su, Shanhua Township, TW;
Abstract
A chemical processing bath and system used in semiconductor manufacturing utilizes a dynamic spiking model that essentially constantly monitors chemical concentration in the processing bath and adds fresh chemical on a regular basis to maintain chemical concentrations at desirable levels. Etch rates and etch selectivities are maintained at desirable levels and contamination from undesirable precipitation is avoided. The system and method automatically compare concentration levels to a plurality of control limits associated with various technologies and identify the technology or technologies that may undergo processing.