The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Jan. 30, 2004
Fang-cheng Chen, Hsin-chu, TW;
LI Te Hsu, Tainan Shien, TW;
I Cheng Tseng, Yongkang, TW;
Hsu Chiung Wen, Taipei, TW;
Tsung Chuan Chen, Tainan, TW;
Pin Chia Su, Shanhua Township, Tainan County, TW;
Fang-Cheng Chen, Hsin-chu, TW;
Li Te Hsu, Tainan Shien, TW;
I Cheng Tseng, Yongkang, TW;
Hsu Chiung Wen, Taipei, TW;
Tsung Chuan Chen, Tainan, TW;
Pin Chia Su, Shanhua Township, Tainan County, TW;
Taiwan Semiconductor Manufacturing Co. Ltd., Hsin-Chu, ROC, TW;
Abstract
A method for controlling a critical dimension in an etched structure comprises the steps of: forming a hard mask above a substrate, measuring a critical dimension of the hard mask, and using the measured hard mask critical dimension to control a critical dimension trim operation performed on a circuit trace above the substrate.