Hsu Chiung Wen

Title: Hsu Chiung Wen: Innovator in Semiconductor Fabrication

Introduction

Hsu Chiung Wen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor fabrication, particularly in critical dimension control processes. His innovative approach has led to advancements that enhance the precision and efficiency of semiconductor manufacturing.

Latest Patents

Hsu Chiung Wen holds a patent for a method titled "Critical dimension control in a semiconductor fabrication process." This patent outlines a process that involves forming a hard mask above a substrate, measuring the critical dimension of the hard mask, and utilizing this measurement to control a critical dimension trim operation performed on a circuit trace above the substrate. This invention is crucial for improving the accuracy of semiconductor devices.

Career Highlights

Hsu Chiung Wen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his innovative ideas and contribute to the advancement of semiconductor technology.

Collaborations

Hsu has collaborated with notable colleagues, including Fang-Cheng Chen and Li Te Hsu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.

Conclusion

Hsu Chiung Wen's contributions to semiconductor fabrication through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.