Leslie G Jerde

Title: Innovations and Contributions of Leslie G Jerde

Introduction

Leslie G Jerde is a prominent inventor based in Novato, California, known for her significant contributions to the field of semiconductor processing. With a total of 15 patents to her name, she has made remarkable advancements that have influenced the industry.

Latest Patents

Among her latest patents is the "Reactor with heated and textured electrodes and surfaces." This invention focuses on a reactor designed for processing semiconductor wafers. It features electrodes and surfaces that can be heated, textured, and/or pre-coated to enhance material adherence and mitigate issues such as spaulding, flaking, and delaminating during wafer processing. Another notable patent is the "Plasma etch reactor and method." This plasma etch reactor includes an upper electrode, a lower electrode, and a peripheral ring electrode. The configuration allows for a solid source of gaseous species and a nozzle that provides a jet stream of process gases, ensuring uniformity at the semiconductor wafer's surface. This innovative design enhances the range of plasma densities within the reactor.

Career Highlights

Leslie has worked with notable companies such as Tegal Corporation and Silicon Valley Bank, where she has applied her expertise in semiconductor technology. Her work has been instrumental in developing advanced solutions that address critical challenges in the industry.

Collaborations

Leslie has collaborated with talented individuals, including Stephen P DeOrnellas and Alferd Cofer, contributing to a dynamic exchange of ideas and innovations.

Conclusion

Leslie G Jerde's contributions to semiconductor processing through her patents and collaborations highlight her role as a leading inventor in the field. Her innovative solutions continue to shape the future of technology.