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For the Inventor, By the Inventor

Campbell, CA, United States of America

Lai Zhao

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This inventor holds 26 USPTO granted patents and 20 published patent applications, primarily in High-K Dielectric Materials. Top assignees: Applied Materials, Inc., Applied Material, Inc.. Active years: 2015-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lai Zhao. Retrieved from https://idiyas.com/inventor/lai-zhao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 96.2

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:

goldMedal25 out of 14,454 
 
Applied Materials, Inc.
 patents
silverMedal1 out of 23 
 
Applied Material, Inc.
 patents

Years Active: 2015-2024

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Areas of Expertise:
High-K Dielectric Materials
Zirconium Oxide
Display Devices
Plasma Induced Damage
Thin Film Transistors
Hybrid Material Film Stacks
Reactive Gas Precursor
Layer Stack
Silicon Nitride Passivation
Amorphous Silicon
Film Deposition Stability
26 patents (USPTO):Explore Patents
1. 12148766 - High-K dielectric materials comprising zirconium oxide utilized in display devices (2024-11-19),
2. 12136538 - Deposition chamber system diffuser with increased power efficiency (2024-11-05),
3. 12080725 - Hybrid high-K dielectric material film stacks comprising zirconium oxide utilized in display devices (2024-09-03),
4. 12076763 - Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursor (2024-09-03),
5. 12021152 - Process to reduce plasma induced damage (2024-06-25),
6. 11895872 - Thin film transistor with small storage capacitor with metal oxide switch (2024-02-06),
7. 11894396 - High-K dielectric materials comprising zirconium oxide utilized in display devices (2024-02-06),
8. 11773489 - Gas confiner assembly for eliminating shadow frame (2023-10-03),
9. 11742362 - Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devices (2023-08-29),
10. 11670722 - Process to reduce plasma induced damage (2023-06-06),
11. 11600642 - Layer stack for display applications (2023-03-07),
12. 11380801 - Process to reduce plasma induced damage (2022-07-05),
13. 11239258 - High-k dielectric materials comprising zirconium oxide utilized in display devices (2022-02-01),
14. 11145683 - Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devices (2021-10-12),
15. 11123837 - Method of removal of sharp corners from diffuser plate (2021-09-21),

Title: The Innovative Journey of Lai Zhao

Introduction: Lai Zhao, a pioneering inventor based in Campbell, CA, is known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Lai Zhao holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing her commitment to creating a more efficient and eco-friendly world.

Career Highlights: With a background in engineering and a passion for problem-solving, Lai Zhao has led numerous successful projects that have revolutionized industries and improved the lives of many.

Collaborations: Throughout her career, Lai Zhao has collaborated with top research institutions, leading companies, and innovative startups to bring her ideas to life and make a lasting impact on society.

Conclusion: Lai Zhao's dedication to innovation, coupled with her relentless pursuit of excellence, continues to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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