Location History:
- Beverly, MA (US) (2000 - 2002)
- Yamanashi, JP (2011)
- Nirasaka, JP (2016)
- Nirasaki, JP (2010 - 2020)
Company Filing History:
Years Active: 2000-2020
Title: Innovations of Kunihiko Hinata
Introduction
Kunihiko Hinata is a distinguished inventor hailing from Nirasaki, Japan. With an impressive portfolio of 13 patents, Hinata has made significant contributions to the field of plasma processing technology. His innovations are pivotal in the advancement of etching processes that are fundamental in the semiconductor industry.
Latest Patents
Among his latest patents, Hinata has developed a plasma processing apparatus and method that enhances the etching process of semiconductor substrates. This innovative method involves supplying an etching gas into a process container where the target substrate is supported. By applying RF power for plasma generation and ion attraction, he has improved the efficiency of turning the etching gas into plasma during the etching process. Notably, his method includes applying a negative DC voltage to the upper electrode to increase the absolute value of self-bias, thereby optimizing the etching performance. The accompanying plasma etching apparatus features a unique design, including a cooling ring and a correction ring around the wafer, enhancing temperature management during the etching process.
Career Highlights
Hinata's career has been marked by his association with Tokyo Electron Limited, a leading company in semiconductor manufacturing equipment. His expertise in plasma technology has positioned him as a vital figure within the organization, contributing to innovative solutions that drive the industry forward. His 13 patents exemplify his commitment to research and development in the field.
Collaborations
Throughout his career, Hinata has collaborated with notable colleagues, including Akira Koshiishi and Masaru Sugimoto. Their partnership has fostered an environment of innovation and shared knowledge, leading to the successful development of advanced technologies in plasma processing.
Conclusion
Kunihiko Hinata's contributions to plasma processing technology underscore his dedication to innovation in the semiconductor industry. With 13 patents to his name, his work continues to shape the future of etching processes, demonstrating the profound impact of his inventions on modern technology. His ongoing collaboration with esteemed coworkers suggests a promising future for further advancements in this vital field.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.