The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2011
Filed:
Dec. 12, 2002
Akira Koshiishi, Yamanashi, JP;
Mitsuru Hashimoto, Yamanashi, JP;
Hideaki Tanaka, Yamanashi, JP;
Shigeru Tahara, Yamanashi, JP;
Kunihiko Hinata, Yamanashi, JP;
Jun Ooyabu, Yamanashi, JP;
Akira Koshiishi, Yamanashi, JP;
Mitsuru Hashimoto, Yamanashi, JP;
Hideaki Tanaka, Yamanashi, JP;
Shigeru Tahara, Yamanashi, JP;
Kunihiko Hinata, Yamanashi, JP;
Jun Ooyabu, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A ring mechanism, comprising a focus ring and divided cover rings surrounding a wafer W placed on a loading table (lower electrode) mounted in a processing chamber, wherein a ring-shaped clearance δis provided between the divided rings to spread plasma to the radial outside of the focus ring to allow plasma to get therein, whereby a potential difference between the wafer W and the focus ring can be eliminated to prevent arc discharge by plasma from occurring between the wafer W and the focus ring.