Tokyo, Japan

Kuniaki Yagi

USPTO Granted Patents = 14 

Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 85(Granted Patents)


Location History:

  • Oume, JP (2004)
  • Ome, JP (2004 - 2014)
  • Tokyo, JP (2002 - 2022)

Company Filing History:


Years Active: 2002-2022

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14 patents (USPTO):Explore Patents

Title: Kuniaki Yagi: Innovator in Semiconductor Technology

Introduction

Kuniaki Yagi is a prominent inventor based in Tokyo, Japan, known for his significant contributions to semiconductor technology. With a total of 14 patents to his name, Yagi has made remarkable advancements in the field, particularly in the development of semiconductor substrates.

Latest Patents

Among his latest patents are innovations related to semiconductor substrates and elements. One notable patent describes a semiconductor substrate that includes a single crystal GaO-based substrate bonded to a polycrystalline substrate. This design features a single crystal GaO-based substrate that is thinner than the polycrystalline substrate, which possesses a higher fracture toughness value. Another important patent focuses on a polycrystalline SiC substrate and its manufacturing method. This patent specifies that the substrate grain size change rate of the polycrystalline SiC substrate is 0.43% or less, with a radius of curvature of 142 m or more.

Career Highlights

Kuniaki Yagi has worked with several notable companies throughout his career, including Hoya Corporation and Sicoxs Corporation. His work in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.

Collaborations

Yagi has collaborated with esteemed colleagues such as Takamitsu Kawahara and Hiroyuki Nagasawa. These partnerships have further enhanced his research and development efforts in the semiconductor industry.

Conclusion

Kuniaki Yagi's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in this field. His innovative work continues to influence advancements in semiconductor substrates and elements.

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